Shunichi Uzawa

This inventor holds 63 USPTO granted patents, primarily in X-Ray Lithography (CPC class 378 ). Top assignees: Canon Kabushiki Kaisha, Mitsubishi Denki Kabushiki Kaisha. Active years: 1981-2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shunichi Uzawa. Retrieved from https://idiyas.com/inventor/shunichi-uzawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 63

% Patents Active = 95.2

Average Co-Inventor Count = 4.1

ph-index = 19

Forward Citations = 946(Granted Patents)

Forward Citations (Not Self Cited) = 908(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Naka, JP (1981 - 1989)
Nakamachi, JP (1992 - 2000)
Setagaya-ku, JP (2003)
Tokyo, JP (1983 - 2005)

Company Filing History:

63 out of 92,901

Canon Kabushiki Kaisha

patents

2 out of 21,351

Mitsubishi Denki Kabushiki Kaisha

patents

where one patent can have more than one assignee

Years Active: 1981-2005

Loading Chart...

Areas of Expertise:

X-Ray Exposure

Semiconductor Manufacturing

Exposure Apparatus

Alignment System

Mask Structure

Substrate Conveying

Temperature Control

Vacuum-Holding

Dose Detectable Mask

Radiation Control

Wafer Table

Workpiece Support

63 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6947519 - X-ray exposure apparatus and method, semiconductor manufacturing apparatus, and microstructure (2005-09-20),

2. 6947518 - X-ray exposure apparatus, X-ray exposure method, X-ray mask, X-ray mirror, synchrotron radiation apparatus, synchrotron radiation method and semiconductor device (2005-09-20),

3. 6647087 - Exposure method (2003-11-11),

4. 6645707 - Device manufacturing method (2003-11-11),

5. 6455203 - Mask structure and method of manufacturing the same (2002-09-24),

6. 6327332 - Exposure method (2001-12-04),

7. 6324250 - Exposure method (2001-11-27),

8. 6272202 - Exposure method and X-ray mask structure for use with the same (2001-08-07),

9. 6167111 - Exposure apparatus for synchrotron radiation lithography (2000-12-26),

10. 6018395 - Alignment system (2000-01-25),

11. 5822389 - Alignment apparatus and SOR X-ray exposure apparatus having same (1998-10-13),

12. 5687947 - Mounting method (1997-11-18),

13. 5680428 - Process for holding an object (1997-10-21),

14. 5641264 - Substrate conveying device and method of controlling the same (1997-06-24),

15. 5610965 - Exposure method (1997-03-11),

Title: Innovations in X-ray Technology by Shunichi Uzawa

Introduction

Shunichi Uzawa is an esteemed inventor based in Tokyo, Japan, known for his significant contributions to X-ray technology and semiconductor devices. With an impressive portfolio of 63 patents, his work has had a profound impact on the fields of medical imaging and materials science.

Latest Patents

Among Uzawa's latest patents are an X-ray exposure apparatus, an X-ray exposure method, an X-ray mask, and an X-ray mirror. He also developed synchrotron radiation apparatus and methods, specifically designed for semiconductor devices. Notably, one of his inventions describes an X-ray exposure apparatus that includes an X-ray mirror composed of materials with an absorption edge in wavelength regions of less than 0.45 nm or exceeding 0.7 nm. This advanced technology allows for the extraction of exposure X-rays from synchrotron radiation sources, enhancing semiconductor manufacturing processes, particularly in implementing X-ray exposure in critical wavelength ranges. The materials used for the X-ray mirror include iron, cobalt, nickel, copper, manganese, chromium, and their respective alloys, nitrides, carbides, and borides.

Career Highlights

Shunichi Uzawa has had a distinguished career, having worked for prominent companies such as Canon and Mitsubishi Electric Corporation. His tenure at these institutions provided him with a platform to develop and refine his innovative ideas in the realm of precision imaging and semiconductor technologies.

Collaborations

Throughout his career, Uzawa has collaborated with notable colleagues, including Takao Kariya and Nobutoshi Mizusawa. These partnerships have facilitated the exchange of ideas and further advanced research in X-ray technology and semiconductor devices.

Conclusion

Shunichi Uzawa's innovative contributions to the field of X-ray technology and semiconductor manufacturing underscore his role as a leading inventor in Japan. With a strong patent portfolio and collaborative efforts, Uzawa continues to push the boundaries of technology, paving the way for future advancements in imaging and materials science.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]