The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 20, 2005

Filed:

Jan. 26, 2001
Applicants:

Kenji Itoga, Hyogo, JP;

Toyoki Kitayama, Hyogo, JP;

Yutaka Watanabe, Tochigi, JP;

Shunichi Uzawa, Tokyo, JP;

Inventors:

Kenji Itoga, Hyogo, JP;

Toyoki Kitayama, Hyogo, JP;

Yutaka Watanabe, Tochigi, JP;

Shunichi Uzawa, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K005/00 ;
U.S. Cl.
CPC ...
Abstract

An X-ray exposure apparatus comprises an X-ray mirror containing a material having an absorption edge only in at least either one of a wavelength region of less than 0.45 nm and a wavelength region exceeding 0.7 nm as to X-rays.


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