The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2005
Filed:
Jan. 26, 2001
Applicants:
Kenji Itoga, Hyogo, JP;
Toyoki Kitayama, Hyogo, JP;
Yutaka Watanabe, Tochigi, JP;
Shunichi Uzawa, Tokyo, JP;
Inventors:
Kenji Itoga, Hyogo, JP;
Toyoki Kitayama, Hyogo, JP;
Yutaka Watanabe, Tochigi, JP;
Shunichi Uzawa, Tokyo, JP;
Assignees:
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K005/00 ;
U.S. Cl.
CPC ...
Abstract
An X-ray exposure apparatus comprises an X-ray mirror containing a material having an absorption edge only in at least either one of a wavelength region of less than 0.45 nm and a wavelength region exceeding 0.7 nm as to X-rays.
Itoga, Kenji. (2005). X-ray exposure apparatus, x-ray exposure method, x-ray mask, x-ray mirror, synchrotron radiation apparatus, synchrotron radiation method and semiconductor device (U.S. Patent No. 6947518). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6947518
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile