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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 5485495 B1

PDFFull Text
Date of Patent:
Jan. 16, 1996

Filed:

Aug. 08, 1994

X-ray mask, and exposure apparatus and device production using the mask

Applicant:
Inventors:

Takeshi Miyachi, Zama, JP;

Nobutoshi Mizusawa, Yamato, JP;

Shinichi Hara, Yokohama, JP;

Hiroshi Maehara, Yokohama, JP;

Assignee:

Canon Kabushiki Kaisha, Tokyo, JP;

Attorney:

Fitzpatrick, Cella, Harper & Scinto

Primary Examiner:

Craig E Church

Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
378 34 ; 378 35 ;
Abstract

A method of producing an X-ray mask includes a step of forming a mask pattern on a mask substrate having an amount of warp, and a step of bonding the mask substrate to a mask frame. In both steps, the mask substrate maintains a shape obtained due to the amount of warp. Since the mask substrate is fixed to the mask frame in a warped state, distortion is not produced in the mask pattern. As a result, an X-ray mask, which is suitable for very precise exposure, is provided.

Find Patent Forward Citations

Miyachi, Takeshi. (1996). X-ray mask, and exposure apparatus and device production using the mask (U.S. Patent No. 5485495). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5485495

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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