Konan, Japan

Nobuo Okazaki

This inventor holds 4 USPTO granted patents. Top assignees: Toyoda Gosei Co., Ltd., Nagoya University, Aisin Seiki Kabushiki Kaisha. Active years: 1986-1993.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuo Okazaki. Retrieved from https://idiyas.com/inventor/nobuo-okazaki-ngnlkbcw

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.4

ph-index = 4

Forward Citations = 526(Granted Patents)


Location History:

  • Konan, JP (1986 - 1993)
  • Inazawa, JP (1993)

Company Filing History:


Years Active: 1986-1993

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4 patents (USPTO):Explore Patents

Title: Nobuo Okazaki: Innovator in Gallium Nitride Semiconductor Technology

Introduction

Nobuo Okazaki is a prominent inventor known for his contributions to the field of semiconductor technology. He is based in Konan, Japan, and holds a total of 4 patents. His work primarily focuses on gallium nitride group compound semiconductor devices, which have significant applications in optoelectronics.

Latest Patents

One of Okazaki's latest patents is for a gallium nitride group compound semiconductor laser diode. This innovative device includes at least one pn junction layer situated between an n-type layer and a p-type layer. The n-type layer is composed of a gallium nitride group compound semiconductor material defined by the composition equation (Al.sub.x Ga.sub.1-x).sub.y In.sub.1-y N, where 0 ≤ x ≤ 1 and 0 ≤ y ≤ 1. The p-type layer, which is doped with an acceptor impurity, is created by electron beam irradiating a gallium nitride group compound semiconductor material defined by a similar composition equation. This improved laser diode is capable of emitting light in the visible short wavelength spectrum, including blue, violet, and ultraviolet regions.

Another significant patent involves a gallium nitride group semiconductor and light-emitting diode. In this invention, a thin film of SiO.sub.2 is patterned on an N layer made of N-type Al.sub.x Ga.sub.1-x N. The I-type Al.sub.x Ga.sub.1-x N is selectively grown, forming an active layer of a light-emitting diode. Electrodes are then formed on the I-layer and conductive layer to complete the light-emitting diode structure.

Career Highlights

Throughout his career, Nobuo Okazaki has worked with notable organizations, including Toyoda Gosei Co., Ltd. and Nagoya University. His research and development efforts have significantly advanced the understanding and application of gallium nitride technology in various electronic devices.

Collaborations

Okazaki has collaborated with esteemed colleagues such as Katsuhide Manabe and Hiroshi Amano. Their joint efforts have contributed to the progress in semiconductor research and development.

Conclusion

Nobuo Okazaki's innovative work in gallium nitride semiconductor technology has made a lasting impact on the field. His

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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