Sendai, Japan

Nobuo Mikoshiba


Average Co-Inventor Count = 2.9

ph-index = 14

Forward Citations = 528(Granted Patents)


Location History:

  • Sendani, JP (1992)
  • Sendai-shi, Miyagi-ken, JP (1985 - 1993)
  • Taihaku-ku, Sendai-shi, Miyagi-ken, JP (1993)
  • Sendai, JP (1980 - 1998)

Company Filing History:


Years Active: 1980-1998

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33 patents (USPTO):Explore Patents

Title: Nobuo Mikoshiba: Pioneering Innovations in Chemical Vapor Deposition

Introduction

Nobuo Mikoshiba, a prominent inventor based in Sendai, Japan, has made significant contributions to the field of chemical vapor deposition with a remarkable portfolio of 33 patents. His innovative work primarily focuses on processes and apparatuses that enhance the quality of film deposition, which is essential in various technological applications.

Latest Patents

Among his latest patents, the "Process for forming deposited film by use of alkyl aluminum hydride" stands out. This invention details a method and apparatus for forming high-quality aluminum films through a chemical vapor deposition (CVD) technique. By utilizing the reaction between alkyl aluminum hydride and hydrogen, Mikoshiba has developed a process that allows selective deposition of aluminum, maintaining pressure in the deposition chamber from 10^-3 to 760 Torr. Additionally, he has patented a "Chemical vapor deposition apparatus," which involves creating excited species of gas-phase compounds, supplying them to a substrate, and applying photoirradiation to facilitate surface reactions for deposited film formation.

Career Highlights

Nobuo Mikoshiba has enjoyed a prolific career, particularly with Canon Kabushiki Kaisha, contributing to numerous advancements in film deposition technology. His expertise in chemical vapor deposition processes has placed him at the forefront of innovation within the semiconductor and materials science industries.

Collaborations

Throughout his career, Mikoshiba has collaborated with notable colleagues, including Kazuo Tsubouchi and Kazuya Masu. These interactions have fostered a creative environment, enabling the exchange of ideas and driving technological progress in their field.

Conclusion

Nobuo Mikoshiba's extensive patent portfolio and his dedication to innovation in chemical vapor deposition processes underscore his significant impact on the industry. His pioneering methods continue to play a crucial role in enhancing the quality of deposited films, demonstrating the essential nature of his contributions to the field of technology.

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