The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 1998
Filed:
Jun. 06, 1995
Applicant:
Inventors:
Nobuo Mikoshiba, Sendai, JP;
Tadahiro Ohmi, Sendai, JP;
Kazuo Tsubouchi, Sendai, JP;
Kazuya Masu, Sendai, JP;
Nobumasa Suzuki, Sendai, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H / ;
U.S. Cl.
CPC ...
427572 ; 118719 ; 118722 ; 1187 / ; 1187 / ; 1187 / ; 1187 / ; 1187 / ; 1187 / ; 1187 / ; 1187 / ; 1187 / ; 1187 / ; 156345 ; 156626 ; 156627 ; 4272552 ; 4272553 ; 427294 ; 427576 ; 427582 ; 427583 ; 427584 ; 427586 ;
Abstract
A process for forming a deposited film on a substrate according to the chemical vapor deposition method comprises previously forming excited species of a gas phase compound containing atoms which become constituents constituting said deposited film, supplying the excited species onto the surface of said substrate and effecting photoirradiation on said substrate surface, thereby forming the deposited film through the surface reaction.