The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 1998
Filed:
Jan. 31, 1995
Applicant:
Inventors:
Junichi Murota, Sendai, JP;
Shoichi Ono, Sendai, JP;
Masao Sakuraba, Sapporo, JP;
Nobuo Mikoshiba, Sendai, JP;
Harushige Kurokawa, Higashimurayama, JP;
Fumihide Ikeda, Toyama, JP;
Assignee:
Kokusai Electric Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C30B / ; C23C / ;
U.S. Cl.
CPC ...
4272481 ; 427586 ; 117 86 ; 117 92 ; 117 93 ; 117103 ; 117108 ;
Abstract
A vapor deposition apparatus and method in which pulse waveform light is applied to a sample sealed in a reaction chamber. The sample is exposed to gaseous material while the pulse waveform light is applied creating one or plural atomic layers. Alternate layers of plural substances or alternate multiple layers of plural substances can be formed by alternating the introduction of gaseous materials with the application of pulse waveform light.