Company Filing History:
1 out of 522 
1 out of 153 Years Active: 1985-1998
Title: Harushige Kurokawa: Innovator in Vapor Deposition Technology
Introduction
Harushige Kurokawa is a notable inventor based in Higashimurayama, Japan. He has made significant contributions to the field of vapor deposition technology, holding 2 patents that showcase his innovative approaches. His work has implications for various industries, particularly in the manufacturing of semiconductor devices.
Latest Patents
Kurokawa's latest patents include a vapor depositing method and a chemical vapor deposition apparatus. The vapor depositing method involves applying pulse waveform light to a sample sealed in a reaction chamber. This method allows for the creation of one or multiple atomic layers by exposing the sample to gaseous material while the pulse waveform light is applied. Additionally, alternate layers of different substances can be formed by alternating the introduction of gaseous materials with the application of pulse waveform light.
The chemical vapor deposition apparatus features a reactor divided into a reaction space and a purging space, with a susceptor that supports a wafer. This design allows for the reduction of pressures in both the reactor and loading chamber, enhancing the efficiency of the process. The apparatus is compact in size and capable of depositing a uniform film with high reproducibility, making it suitable for processing one or a small number of wafers at a time.
Career Highlights
Throughout his career, Kurokawa has worked with prominent companies such as Nippon Telegraph and Telephone Public Corporation and Kokusai Electric Co., Ltd. His experience in these organizations has contributed to his expertise in vapor deposition technologies and their applications in various fields.
Collaborations
Kurokawa has collaborated with notable colleagues, including Junichi Murota and Satoshi Nakayama. These partnerships have likely fostered innovation and the exchange of ideas in their respective fields.
Conclusion
Harushige Kurokawa's contributions to vapor deposition technology through his patents and career experiences highlight his role as an influential inventor. His work continues to impact the semiconductor industry and beyond.