Nobuo Ando

This inventor holds 15 USPTO granted patents, primarily in Chemically Amplified Resists. Top assignee: Sumitomo Chemical Company, Limited. Active years: 2009-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuo Ando. Retrieved from https://idiyas.com/inventor/nobuo-ando-guv3m7fu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 15

% Patents Active = 86.7

Average Co-Inventor Count = 2.5

ph-index = 3

Forward Citations = 50(Granted Patents)

Company Filing History:

15 out of 6,965

Sumitomo Chemical Company, Limited

patents

Years Active: 2009-2013

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Areas of Expertise:

Photoresist Composition

Chemically Amplified Resist

Polymer

Acid Generator

Resin

Compound

Positive Resist

Phenol Compound

Polyhydric Compound

Resist Composition

Composition Preparation

Chemical Composition

15 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8524440 - Photoresist composition (2013-09-03),

2. 8476473 - Compound, method for preparing the compound and resist composition containing the compound (2013-07-02),

3. 8378016 - Chemically amplified positive resist composition (2013-02-19),

4. 8232039 - Polymer and resist composition comprising the same (2012-07-31),

5. 8173352 - Resist composition (2012-05-08),

6. 8158329 - Compound and chemically amplified resist composition containing the same (2012-04-17),

7. 8124803 - Salt suitable for an acid generator and a chemically amplified resist composition containing the same (2012-02-28),

8. 8110336 - Resin and chemically amplified resist composition comprising the same (2012-02-07),

9. 8071270 - Polyhydric compound and chemically amplified resist composition containing the same (2011-12-06),

10. 8062830 - Chemically amplified positive resist composition (2011-11-22),

11. 8057983 - Chemically amplified positive resist composition (2011-11-15),

12. 7932334 - Resin suitable for an acid generator (2011-04-26),

13. 7794914 - Chemically amplified positive resist composition (2010-09-14),

14. 7741007 - Chemicallly amplified resist composition (2010-06-22),

15. 7494763 - Polyhydric phenol compound and chemically amplified resist composition containing the same (2009-02-24),

Title: The Innovative Journey of Nobuo Ando

Introduction: Nobuo Ando is a renowned inventor hailing from Toyonaka, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Nobuo Ando holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his continuous dedication to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Nobuo Ando has worked with leading tech companies and research institutions, playing a pivotal role in the development of cutting-edge technologies that have revolutionized various industries.

Collaborations: Throughout his career, Nobuo Ando has collaborated with top engineers, scientists, and researchers from around the world, fostering a culture of innovation and knowledge sharing that has led to numerous breakthrough inventions.

Conclusion: Nobuo Ando's passion for innovation and his relentless pursuit of technological excellence have solidified his position as a visionary inventor, inspiring the next generation of innovators to push the limits of what is possible in the world of technology.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]