Sumitomo Chemical Company, Limited

Nobuo Ando

Ichiki Takemoto

Isao Yoshida

Yukako Harada

Yusuke Fuji

Junji Shigematsu

Satoshi Yamaguchi

Takayuki Miyagawa

Satoshi Yamamoto

Kazuhiko Hashimoto

Mitsuhiro Hata

Yuko Yamashita

The present invention provides a photoresist composition comprising a resin which comprises a structural unit represented by the formula (I): wherein Qand Qindependently represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group etc., Xrepresents &#x2014;O&#x2014;CO&#x2014; etc., and Arepresents an organic counter ion, and a compound represented by the formula (D'): wherein R, R, Rand Rindependently represent a C1-C20 alkyl group etc., and Arepresents a C1-C36 saturated cyclic hydrocarbon group which may have one or more substituents and which may contain one or more heteroatoms.

Photoresist composition

A compounds represented by the Formula (I) or the Formula (I'). 

Compound, method for preparing the compound and resist composition containing the compound

The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.

Chemically amplified positive resist composition

A polymer comprising a structural unit represented by the formula (I): wherein Rrepresents a hydrogen atom or a methyl group, X represents a linear or branched chain C1-C6 alkylene group, Z represents a group represented by the formula (Ia): wherein Ris independently in each occurrence a linear or branched chain C1-C6 alkyl group and m represents an integer of 0 to 15, and a structural unit represented by the formula (II): wherein Rrepresents a hydrogen atom or a methyl group, Ris independently in each occurrence a linear or branched chain C1-C6 alkyl group and n represents an integer of 0 to 4.

Polymer and resist composition comprising the same

Resist composition

The present invention provides a compound represented by the formula (I): wherein P, P, P, Pand Peach independently represents a hydrogen atom etc., and at least one selected from the group consisting of R, R, R, R, R, R, R, Rand Ris the group represented by the formula (II): 

Compound and chemically amplified resist composition containing the same

The present invention provides a salt of the formula (L) A salt of the formula (L): wherein Q represents &#x2014;CO&#x2014; group or &#x2014;C(OH)&#x2014; group; ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms in which a hydrogen atom is substituted with a hydroxyl group at Q position when Q is &#x2014;C(OH)&#x2014; group or in which two hydrogen atoms are substituted with &#x2550;O group at Q position when Q is &#x2014;CO&#x2014; group, and at least one hydrogen atom in the monocylic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Rand Reach independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and Arepresents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (L).

Salt suitable for an acid generator and a chemically amplified resist composition containing the same

A resin comprising a structural unit represented by the formula (I): wherein Qand Qrepresent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group in which one or more &#x2014;CH&#x2014; may be replaced by &#x2014;O&#x2014; etc., Xrepresents &#x2014;O&#x2014;CO&#x2014; etc., and Arepresents an organic counter ion.

Resin and chemically amplified resist composition comprising the same

The present invention provides a polyhydric compound represented by the formula (I): wherein Rto Reach independently represent a hydrogen atom etc., at least one selected from the group consisting of Rto Ris a group represented by the formula (II): wherein Qand Qeach independently represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group etc., and Arepresents an organic counter ion, andthe others are hydrogen atoms or groups represented by the formula (III): wherein Xto Xeach independently represent a hydrogen atom etc., n represents an integer of 0 to 3, W represents any one of the following groups: Zrepresents a C1-C6 alkyl group etc., and ring Y represents a C3-C20 alicyclic hydrocarbon group, anda chemically amplified resist composition containing the same.

Polyhydric compound and chemically amplified resist composition containing the same

The present invention provides a chemically amplified resist composition comprising:

Resin suitable for an acid generator

The present invention provides a chemically amplified resist composition comprising: wherein R, Q, Q, and Adefined in the specification; wherein R, Q, Q, and Aare defined in the specification; and

Chemicallly amplified resist composition

The present invention provides a polyhydric phenol compound represented by the formula (I): wherein at least one selected from R, R, R, R, and Ris a group represented by the formula (II): 

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Toyonaka, Japan

Nobuo Ando