Somerville, MA, United States of America

Nilay A Pradhan


Average Co-Inventor Count = 4.5

ph-index = 2

Forward Citations = 6(Granted Patents)


Location History:

  • Waltham, MA (US) (2014)
  • Somerville, MA (US) (2016)

Company Filing History:


Years Active: 2014-2016

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3 patents (USPTO):

Title: The Innovative Contributions of Nilay A. Pradhan

Introduction

Nilay A. Pradhan is a notable inventor based in Somerville, MA, with a significant impact in the field of semiconductor technology. He holds three patents that showcase his expertise and innovative approach to improving device processing techniques. His work is instrumental in advancing the capabilities of modern semiconductor devices.

Latest Patents

Pradhan's latest patents include a method for improving fin isolation and a technique for selectively processing three-dimensional devices. The first patent describes a method of processing a workpiece to create a doped fin structure. This involves subjecting a portion of the workpiece to a pre-amorphizing implant to create an amorphized region, which is then implanted with dopant species. The dopant profile is designed to be box-like, ensuring that the dopant is confined to the previously amorphized region. The second patent outlines a method to selectively process a three-dimensional device. This method includes providing a substrate with a first surface that extends horizontally and a structure containing a second surface that extends vertically. A film comprising carbon species is applied to the substrate, and a selected portion of the film is etched using an etchant that excludes oxygen and fluorine species.

Career Highlights

Nilay A. Pradhan is currently employed at Varian Semiconductor Equipment Associates, Inc., where he continues to contribute to the field of semiconductor technology. His innovative methods have the potential to enhance the performance and efficiency of semiconductor devices, making significant strides in the industry.

Collaborations

Throughout his career, Pradhan has collaborated with talented individuals such as Benjamin Colombeau and Stanislav S. Todorov. These collaborations have likely enriched his work and contributed to the development of his innovative patents.

Conclusion

Nilay A. Pradhan's contributions to semiconductor technology through his patents demonstrate his commitment to innovation and excellence in the field. His work not only advances technology but also sets a foundation for future developments in semiconductor processing.

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