The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 2016

Filed:

Dec. 11, 2013
Applicant:

Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);

Inventors:

Nilay A. Pradhan, Somerville, MA (US);

Benjamin Colombeau, Salem, MA (US);

Naushad K. Variam, Marblehead, MA (US);

Mandar B. Pandit, Santa Clara, CA (US);

Christopher Dennis Bencher, Cupertino, CA (US);

Adam Brand, Palo Alto, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 29/66 (2006.01); H01L 21/311 (2006.01); H01L 21/265 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66795 (2013.01); H01L 21/26513 (2013.01); H01L 21/31122 (2013.01); H01L 21/26586 (2013.01); H01L 29/66803 (2013.01);
Abstract

A method to selectively process a three dimensional device, comprising providing a substrate having a first surface that extends horizontally, the substrate comprising a structure containing a second surface that extends vertically from the first surface; providing a film on the substrate, the film comprising carbon species; and etching a selected portion of the film by exposing the selected portion of the film to an etchant containing hydrogen species, where the etchant excludes oxygen species and fluorine species.


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