Nilabh Kumar Roy

Title: Innovations of Nilabh Kumar Roy

Introduction

Nilabh Kumar Roy is a prominent inventor based in Austin, Texas. He has made significant contributions to the field of imprint lithography and photomechanical shaping systems. With a total of 15 patents to his name, Roy's work has advanced the technology used in various applications.

Latest Patents

One of his latest patents is a method for improving the accuracy of imprint force application in imprint lithography. This method involves correcting a final imprint force in an imprint process by obtaining position traces of an imprint head along a predetermined trajectory. A force disturbance model is established based on prior position and force traces, allowing for precise adjustments to be made during the imprinting process. Another notable patent is a system and method for generating a set of illumination patterns for use in a photomechanical shaping system. This innovation computes a predicted dosage pattern based on intensity distribution and operational parameters, ensuring optimal performance in shaping materials on substrates.

Career Highlights

Throughout his career, Nilabh Kumar Roy has worked with notable organizations such as Canon Kabushiki Kaisha and the University of Texas System. His experience in these institutions has contributed to his expertise in the field and has allowed him to develop groundbreaking technologies.

Collaborations

Roy has collaborated with several professionals in his field, including Mario Johannes Meissl and Anshuman Cherala. These collaborations have fostered innovation and have led to the development of advanced technologies in imprint lithography and photomechanical shaping.

Conclusion

Nilabh Kumar Roy's contributions to the field of technology through his patents and collaborations highlight his role as a leading inventor. His work continues to influence advancements in imprint lithography and photomechanical shaping systems.