The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 21, 2022

Filed:

Dec. 18, 2019
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Anshuman Cherala, Austin, TX (US);

Nilabh K. Roy, Austin, TX (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); B29C 35/08 (2006.01); B82Y 40/00 (2011.01); B82Y 10/00 (2011.01); B81C 1/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B29C 35/0805 (2013.01); B81C 1/0046 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); B29C 2035/0833 (2013.01);
Abstract

Methods and systems for imprinting, including receiving template slippage data about a change in a position of a template relative to a reference position. Also, a desired actinic radiation pattern to expose formable material in an imprinting field under a template border region of the template may be received. In addition, a new actinic radiation pattern to expose the template border region that compensates for the template slippage may be determined. The formable material in the imprinting field on the substrate may be contacted with the template. The template border region may be exposed to the new actinic radiation pattern while the template is in contact with the formable material.


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