Canon Kabushiki Kaisha

The University of Texas System

Nilabh Kumar Roy

Mario Johannes Meissl

Anshuman Cherala

Byung-Jin Choi

Seth J Bamesberger

Masaki Saito

Edward Brian Fletcher

Chee Seng Foong

Mehul N Patel

Xiaoming Lu

James W Irving

Michael Cullinan

Ozkan Ozturk

Anil Yuksel

Alex Ruiz

A system and method for generating a modulation map to be supplied a spatial light modulator of a nanoimprint lithography system. Receiving a pixelated intermediate map for a spatial light modulator including a plurality of pixels based on a distortion model and a target light pattern. The pixelated intermediate map may have discontinuities. Generating a modulation map for the spatial light modulator by filling in discontinuities in the pixelated intermediate map. A first predicted light intensity map produced by the modulation map may be a closer approximation of the target light pattern than a second predicted light intensity map produced by the pixelated intermediate map.

System and method of generating a modulation map for a spatial light modulator to illuminate a template used in a photomechanical shaping system

Some devices, systems, and methods obtain a set of relationship values, wherein the set of relationship values indicates relationships between control values for an imprint apparatus and corresponding overlay corrections; and estimate a set of control values based on a constrained optimization that uses the set of relationship values such that the set of control values globally minimizes a residual overlay error while the set of control values is maintained within a set of operating constraints, wherein the set of control values includes a set of in-plane control values that are in a plane and a set of out-of-plane control values that are out of the plane, wherein the plane is parallel to a template-substrate interface.

System and method for generating control values for overlay control of an imprint tool

An apparatus can include a bonding head. The bonding head can include a bonding head body, a die chuck body, and lands. The bonding head body can be coupled to the die chuck. The lands can define zones. The lands and zones can be configured so that an outer zone can be under vacuum to hold a die while an inner zone is pressurized to cause the die to bow away from the bonding head. The bowed die has a relatively smoother curvature as compared to a die bent by bowing a die chuck that has pins, lands, or both. When the die contacts a substrate using the novel bonding head, the likelihood of trapping air and creating a void during a bonding operation is significantly reduced.

Apparatus including a bonding head and a method of using the same

A method for correcting a final imprint force FIF in an imprint process is provided. Position traces of an imprint head exercising along a predetermined trajectory are obtained. A force disturbance model is established based on prior position and force traces of the imprint head. A disturbance force Fis using a predetermined motion sequence based on the force disturbance model for wafer i, where i=1 to n. A residual force offset (RFO) measurement is performed to determine an actual force Fapplied to wafer i. A disturbance force Fapplied to a field j of the wafer i is calculated using the force disturbance model, where j=1 to m. An adjustment is applied to the RFO measurement. An imprint force is applied to a film on the wafer i with the imprint head based on an output of the adjustment applied to Fand a desired force to be applied to the film on the wafer.

Method for improving accuracy of imprint force application in imprint lithography

System and method for generating a set of illumination patterns. Intensity distribution for each pixel in an array of pixels of actinic radiation at a plane of a shaping surface while it is in contact with formable material on a substrate is received. Predicted dosage pattern based on the intensity distribution for each pixel and a set of operational parameters is computed. Set of operational parameters may include sets of: modulation maps; positional shifts of an array of illuminators; duty cycles. Curing dose variation metric based on the predicted dosage pattern is determined. The curing dose variation metric is compared to a threshold. Different sets of operational parameters may be used to create an operational parameters superset. The curing set of operational parameters in the operational parameters superset is selected based on a comparison of the curing dose variation metric to a dose variation threshold.

System and method of generating a set of illumination patterns for use in a photomechanical shaping system

A method and system for optimizing forces applied to actuators during a nanoimprint lithography process is provided. A first set of forces within a first set of force limits is selected to be applied to edges of a template. A first residual distortion representative of a first predicted overlay error associated with a simulated imprinting method in which the first set of forces are applied to the edges of the template is estimated. A second set of forces is selected within a second set of force limits to be applied to the edges of the template. A second residual distortion is estimated that is representative of a second predicted overlay error associated with the simulated imprinting method in which the second set of forces are applied to edges of the template. An initial set of forces having a narrowest set of force limits and residual distortion that is below a residual threshold from among the first set of forces and the second set of forces is selected.

Apparatus and method for optimizing actuator forces

A system and method of shaping a film with a template on a substrate. Generating a first series of parameters from tests performed on a first series of films formed with: a set of shaping conditions; a calibration measurement parameter determined for each substrate prior to shaping; and a first scaling parameter. Generating a second series of parameters from the tests performed on a second series of films produced formed with the set of shaping conditions. The second series of films produced with the calibration measurement parameter determined for each substrate; and a second scaling parameter; or without the calibration measurement parameter. Generating a scaling parameter from: the first series of the parameters; and the second series of parameters. Generating the calibration measurement parameter prior to forming the film. Forming the film using the set of shaping conditions, the calibration measurement parameter, and the scaling parameter.

System and method for shaping a film with a scaled calibration measurement parameter

An imprint method is provided. The method includes exercising an imprint head along a preconditioning trajectory before contacting the imprint head with a formable material on a substrate, followed by performing imprinting on the formable material after exercising the imprint head. The exercise of the imprint head along the preconditioning trajectory may be performed after the imprint head has been idled for a predetermined period of time. The exercise of the imprint head along the preconditioning trajectory may also be performed for a duration decided based on expected throughput requirements and tools used for the imprinting process.

A chuck for retaining a superstrate or a template. The chuck comprises a geometric structure formed on a surface of the chuck. The geometric structure includes at least one of a rounded edge portion and a roughened surface portion, such that an intensity variation of light transmitting through the geometric structure and an area of the chuck adjacent to the geometric structure is reduced.

Superstrate chuck, method of use, and method of manufacturing an article

A shaping system and method of shaping with the shaping system. The shaping system may include a spatial light modulator. The shaping system may include a radiation source to illuminate the spatial light modulator with actinic radiation. The shaping system may include a beam splitter configured to receive actinic radiation from the spatial light modulator and emit a first image of the spatial light modulator and a second image of the spatial light modulator. The shaping system may include a beam combiner configured to receive the first image and the second image and emit a combined image. The combined image may include the first image; and the second image offset from the first image. The shaping system may include a projection system configured to receive the combined image and illuminate formable material between a template and a substrate with a projected image at a plane of the formable material.

Curing a shaped film using multiple images of a spatial light modulator

Techniques and mechanisms for cooling a substrate in a processing chamber by a bi-directional cooling process prior to transferring the substrate outside the processing chamber are provided. First cooling gas is introduced into the processing chamber from an upper gas source in a downward direction towards the upward facing surface of the substrate. An apparatus is placed underneath and in proximity to the substrate. Second cooling gas is introduced from the apparatus into the processing chamber in an upward direction towards the downward facing surface of the substrate. One or more gaps are cut out of the body portion of the apparatus, the gaps configured to allow the apparatus to avoid contact with the support structure holding the substrate, as the apparatus is moved in a horizontal direction into position underneath the substrate during placement of the body portion of the apparatus in proximity to the substrate.

Method, system and apparatus for cooling a substrate

A method of forming a planarization layer on a substrate is disclosed. The method can include aligning a superstrate with the substrate, where aligning the superstrate with the substrate comprises tuning a diffusing element to a first operational state, dispensing a formable material over the substrate, contacting the formable material over the substrate with the superstrate, tuning the diffusing element to a second operational state, where the first operational state is different from the second operational state, and curing the formable material over the substrate to form a layer over the substrate while the superstrate is contacting the formable material, where curing the formable material can include directing a set of actinic radiation beams to enter the diffusing element at an entering state and exit the diffusing element at an exiting state, and where the entering state is different from the exiting state.

Exposure apparatus for uniform light intensity and methods of using the same

An imprint apparatus is provided. The imprint apparatus includes an imprint head, at least one cable assembly configured to supply a signal to the imprint head, and a cable assembly sensor configured to detect a state of the at least one cable assembly. The signal may include one or more of a voltage signal, a current signal, and a pneumatic signal. The cable assembly sensor may include a strain gauge configured to measure a strain of the at least one cable assembly or a load cell configured to measure a force on the at least one cable assembly. For example, the cable assembly may include an electric wire and/or a gas supply tube.

Apparatus and method for improving accuracy of imprint force application in imprint lithography

A system and method of forming a planarization layer on a substrate is disclosed. The method can include holding a superstrate with a superstrate chuck, the superstrate chuck positioned relative to a diffusing element, where the diffusing element includes a pattern and the superstrate chuck includes one or more geometric features, and where the pattern of the diffusing element aligns with the one or more geometric features of the superstrate chuck. The method can also include dispensing a formable material over the substrate, contacting the formable material over the substrate with a superstrate, providing a set of beams that pass through the diffusing element to cure the formable material over the substrate and form a layer over the substrate while the superstrate is contacting the formable material.

Apparatus for uniform light intensity and methods of using the same

Methods and systems for imprinting, including receiving template slippage data about a change in a position of a template relative to a reference position. Also, a desired actinic radiation pattern to expose formable material in an imprinting field under a template border region of the template may be received. In addition, a new actinic radiation pattern to expose the template border region that compensates for the template slippage may be determined. The formable material in the imprinting field on the substrate may be contacted with the template. The template border region may be exposed to the new actinic radiation pattern while the template is in contact with the formable material.

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Austin, TX, United States of America

Nilabh Kumar Roy