Nicholas Rimmer

Title: Innovations of Nicholas Rimmer

Introduction

Nicholas Rimmer is a notable inventor based in Oxford, GB. He has made significant contributions to the field of material science, particularly in the area of vapor deposition techniques. With a total of two patents to his name, Rimmer's work has implications for various industrial applications.

Latest Patents

Rimmer's latest patents include a method of plasma vapor deposition and a method of forming amorphous TiN by thermal chemical vapor deposition (CVD). The plasma vapor deposition method induces the deposition of metal into a recess in a workpiece. This method achieves re-sputtering of the metal at the base of the recess using a mixture of argon and helium and/or neon as the sputter gas, with a ratio of helium and/or neon to argon of at least about 10:1. His second patent involves a modified TDEAT-based MOCVD precursor for the deposition of thin amorphous TiN:Si diffusion barrier layers. This modified precursor, doped with 10 at % silicon, shows improvements in coating conformality, a reduction in resistivity, and an amorphous structure, as demonstrated by various analytical techniques.

Career Highlights

Throughout his career, Nicholas Rimmer has worked with several companies, including Aviza Technology Limited and SPTS Technologies Limited. His experience in these organizations has allowed him to refine his skills and contribute to innovative projects in the field of vapor deposition.

Collaborations

Rimmer has collaborated with notable colleagues such as Stephen Robert Burgess and Andrew Price. Their combined expertise has likely enhanced the quality and impact of their work in the industry.

Conclusion

Nicholas Rimmer's contributions to the field of material science through his innovative patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in vapor deposition techniques and related applications.