Narae Han

Title: Narae Han: Innovator in Semiconductor Technology

Introduction

Narae Han is a prominent inventor based in Suwon-si, South Korea. She has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. Her work focuses on advanced materials and devices that enhance the performance and efficiency of electronic components.

Latest Patents

Among her latest patents is a high-K capacitor dielectric that features a metal oxide area comprising boron. This semiconductor device includes a lower electrode, an upper electrode isolated from direct contact with the lower electrode, and a dielectric layer situated between them. The dielectric layer consists of multiple metal oxide areas, with the third area containing boron and various metal elements such as aluminum, magnesium, silicon, or beryllium. The content of boron is carefully controlled to be less than or equal to that of the metal elements. Another notable patent involves a semiconductor device that includes a dielectric structure with a leakage current reducing layer, which also utilizes metal oxides.

Career Highlights

Narae Han has worked with leading organizations in the technology sector, including Samsung Electronics Co., Ltd. and the Korea Advanced Institute of Science and Technology. Her experience in these prestigious companies has allowed her to develop innovative solutions that address critical challenges in semiconductor design and manufacturing.

Collaborations

Throughout her career, Narae has collaborated with talented individuals such as Jeonggyu Song and Yongsung Kim. These partnerships have fostered a creative environment that has led to groundbreaking advancements in her field.

Conclusion

Narae Han's contributions to semiconductor technology exemplify her dedication to innovation and excellence. Her patents reflect her expertise and commitment to advancing electronic device performance.