Naoya Hirakawa

Title: Naoya Hirakawa: Innovator in Substrate Processing Technologies

Introduction

Naoya Hirakawa is a prominent inventor based in Kumamoto, Japan. He has made significant contributions to the field of substrate processing, holding a total of 5 patents. His innovative work focuses on improving the uniformity and efficiency of coating processes, which are crucial in various manufacturing applications.

Latest Patents

Hirakawa's latest patents include a "Reduced-pressure drying unit and coating film forming method." This invention features a hermetic container equipped with a substrate mount, a vacuum exhauster, a current member, and a current member raising and lowering mechanism. By adjusting the current member based on the pressure inside the hermetic container, the liquid flow of the coating solution on the substrate can be controlled, ensuring uniform film thickness.

Another notable patent is the "Substrate processing method and substrate processing system." This invention outlines a method for processing a substrate by coating a solution while moving a discharge nozzle relative to the substrate. After applying the coating solution, the substrate is exposed to a solvent atmosphere or subjected to temporary pressure in a container. The pressure is then reduced to dry the coating solution, which helps narrow the edge cutting width and maintain in-plane uniformity of the coating film.

Career Highlights

Naoya Hirakawa is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at this organization has allowed him to develop and refine his innovative technologies, contributing to advancements in substrate processing.

Collaborations

Hirakawa collaborates with talented coworkers, including Takahiro Kitano and Shinichi Sugimoto. Their combined expertise fosters a creative environment that drives innovation in their projects.

Conclusion

Naoya Hirakawa's contributions to substrate processing technologies demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in coating processes, making him a valuable asset in the field.