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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6808566 B1

PDFFull Text
Expired
Date of Patent:
Oct. 26, 2004

Filed:

Aug. 14, 2002

Reduced-pressure drying unit and coating film forming method

Applicant:
Inventors:

Takahiro Kitano, Kumamoto, JP;

Manabu Hama, Kumamoto, JP;

Shinichi Sugimoto, Kumamoto, JP;

Naoya Hirakawa, Kumamoto, JP;

Assignee:

Tokyo Electron Limited, Tokyo, JP;

Attorney:

Oblon, Spivak, McClelland, Maier & Neustadt, P.C.

Primary Examiner:

Long Pham

Assistant Examiner:

Ginette Peralta

Int. Cl.
CPC ...
B05C 1/100 ;
U.S. Cl.
CPC ...
B05C 1/100 ;
Abstract

The invention includes a hermetic container provided with a substrate mount; a vacuum exhauster connected to the hermetic container; a current member; and a current member raising and lowering mechanism. When the current member is raised and lowered as a function of the pressure inside the hermetic container, a liquid flow of the coating solution on the substrate is controlled, thereby controlling the uniformity of the film thickness of the coating solution.

Find Patent Forward Citations

Kitano, Takahiro. (2004). Reduced-pressure drying unit and coating film forming method (U.S. Patent No. 6808566). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6808566

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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