Naotoshi Endo

Title: Naotoshi Endo: Innovator in Radiation-Induced Graft Polymerization

Introduction

Naotoshi Endo is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of polymer science, particularly in radiation-induced graft polymerization. With a total of three patents to his name, Endo's work has advanced the understanding and application of polymer substrates.

Latest Patents

Endo's latest patents include innovative methods and materials related to radiation graft polymerization. One of his notable inventions is a polymer substrate for radiation-induced graft polymerization and filter stock. This invention features a radiation graft treated material in the form of woven or non-woven fabric, composed of polymer monofilament fiber, where only the surface has undergone radiation-induced graft polymerization, while the center remains unaffected. Another significant patent outlines a method for performing radiation-induced graft polymerization on substrates made of woven or non-woven fabric. This method involves exposing the substrate to electron beams in a nitrogen atmosphere and subsequently contacting it with a specified amount of monomer, allowing for efficient graft polymerization.

Career Highlights

Throughout his career, Naotoshi Endo has worked with notable companies, including Ebara Corporation. His experience in these organizations has allowed him to refine his expertise in polymer technology and contribute to various innovative projects.

Collaborations

Endo has collaborated with esteemed colleagues such as Takanobu Sugo and Kunio Fujiwara. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in their respective fields.

Conclusion

Naotoshi Endo's contributions to radiation-induced graft polymerization have positioned him as a key figure in polymer science. His innovative patents and collaborations reflect his commitment to advancing technology in this area.