The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2004
Filed:
Dec. 04, 2002
Takanobu Sugo, Gunma, JP;
Kunio Fujiwara, Kanagawa, JP;
Hideo Kawazu, Kanagawa, JP;
Teruo Masubuchi, Chiba, JP;
Junichi Kanno, Kanagawa, JP;
Naotoshi Endo, Tokyo, JP;
Masaji Akahori, Tokyo, JP;
Ebara Coporation, Tokyo, JP;
Abstract
A method for performing radiation-inducted graft polymerization on substrates in the form of webs of woven or non-woven fabric, which includes the steps of exposing a substrate woven or non-woven fabric composed of polymer fiber to electron beams in a nitrogen atmosphere, contacting the irradiated substrate with a specified amount of monomer in a nitrogen atmosphere, and subjecting the monomer and the substrate in mutual contact to graft polymerization in a nitrogen atmosphere, characterized in that the first through third steps are performed in succession.