The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2003
Filed:
Feb. 09, 2001
Takanobu Sugo, Gunma, JP;
Kunio Fujiwara, Kanagawa, JP;
Hideo Kawazu, Kanagawa, JP;
Teruo Masubuchi, Chiba, JP;
Junichi Kanno, Kanagawa, JP;
Naotoshi Endo, Tokyo, JP;
Masaji Akahori, Tokyo, JP;
Ebara Corporation, Tokyo, JP;
Abstract
A polymer substrate for radiation-induced graft polymerization in the form of a woven or non-woven fabric that comprises a woven or non-woven fabric composed of polymer fiber and a reinforcement polymer having a greater strength and a slower rate of radiation-induced graft polymerization than said polymer fiber. Also, radiation graft treated stock prepared from said polymer substrate. In another aspect, a radiation graft treated material in the form of a woven or non-woven fabric material that is composed of polymer monofilament fiber of which only the surface has undergone a radiation-induced graft polymerization but of which the center remains unaffected by grafting. In addition, a method for performing radiation-induced graft polymerization on substrates in the form of webs of woven or non-woven fabric, which comprises the steps of exposing a substrate woven or non-woven fabric composed of polymer fiber to electron beams in a nitrogen atmosphere, contacting the irradiated substrate with a specified amount of monomer in a nitrogen atmosphere, and subjecting the monomer and the substrate in mutual contact to graft polymerization in a nitrogen atmosphere, characterized in that the first through third steps are performed in succession.