Location History:
- Hachioji, JP (2014 - 2016)
- Tokyo, JP (2018 - 2024)
Company Filing History:
9 out of 1,142 
1 out of 42,508 
1 out of 3,562 Years Active: 2014-2025
Title: Naoki Inoue: Innovator in Thin Film Deposition Technologies
Introduction
Naoki Inoue is a prominent inventor based in Tokyo, Japan, known for his significant contributions to the field of thin film deposition technologies. With a total of 13 patents to his name, Inoue has developed innovative methods that enhance the precision and efficiency of substrate processing.
Latest Patents
Among his latest patents is a method and system for forming patterned features on a surface of a substrate using a plasma-enhanced cyclical deposition process. This invention discloses exemplary methods that involve creating a transformable layer with a first material and subsequently exposing it to energy to form a second material. The selective etching capability between the first and second materials is a notable feature of this technology. Another significant patent is a thin film deposition process that allows for high-precision control of the in-plane distribution of a thin film on a substrate. This process utilizes atomic layer deposition (ALD) and includes a series of steps to ensure optimal thin film formation.
Career Highlights
Inoue has worked with notable companies such as ASM IP Holding B.V. and Hitachi, Ltd. His experience in these organizations has contributed to his expertise in the field of materials science and engineering.
Collaborations
Throughout his career, Inoue has collaborated with talented individuals, including Ryu Nakano and Taku Omori. These collaborations have fostered innovation and the development of advanced technologies in thin film deposition.
Conclusion
Naoki Inoue's work in thin film deposition technologies has made a significant impact on the industry. His innovative patents and collaborations highlight his role as a leading inventor in this field.