Omuta, Japan

Naoki Fukagawa

This inventor holds 10 USPTO granted patents and 4 published patent applications and 1 EPO patent. Top assignees: Nippon Yttrium Co., Ltd., Mitsui Kinzoku Company, Limited. Active years: 2016-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoki Fukagawa. Retrieved from https://idiyas.com/inventor/naoki-fukagawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10 

% Patents Active = 80.0

 

Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 19(Granted Patents)


Location History:

  • Fukuoka, JP (2016 - 2017)
  • Omuta, JP (2019 - 2023)

Company Filing History:


Years Active: 2016-2026

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10 patents (USPTO):Explore Patents

Title: Naoki Fukagawa: Innovator in Material Science

Introduction

Naoki Fukagawa is a prominent inventor based in Omuta, Japan, known for his significant contributions to material science. With a total of eight patents to his name, Fukagawa has made strides in developing advanced materials for various applications.

Latest Patents

Fukagawa's latest patents include a novel material for cold spraying. This material comprises a powder of a compound of a rare earth element, characterized by a specific surface area of 30 m/g or more, as determined by a BET single-point method. The powder is designed to have a volume of pores with a pore size of 3 to 20 nm, measuring 0.08 cm/g or more through a gas absorption method. Additionally, it features a crystallite diameter of 25 nm or less and a repose angle ranging from 10 to 60 degrees. In the L*a*b* color system, the powder exhibits a value L of 85 or more, with values a ranging from -0.7 to 0.7, and value b from -1 to 2.5. Another significant patent involves a film-forming material and film, which includes a coating material containing an oxyfluoride of yttrium. This coating material has a Fisher diameter of 1.0 to 10 micrometers and a tap density to apparent density ratio of 1.6 to 3

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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