Osaka, Japan

Naohisa Sengoku

USPTO Granted Patents = 9 

Average Co-Inventor Count = 2.0

ph-index = 3

Forward Citations = 102(Granted Patents)


Location History:

  • Takatsuki, JP (2003 - 2005)
  • Kanagawa, JP (2005 - 2010)
  • Hyogo, JP (2011)
  • Osaka, JP (2002 - 2019)

Company Filing History:


Years Active: 2002-2019

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9 patents (USPTO):Explore Patents

Title: The Innovative Mind of Naohisa Sengoku

Introduction

Naohisa Sengoku is a prominent inventor based in Osaka, Japan, recognized for his significant contributions to the field of semiconductor technology. With a remarkable portfolio of nine patents, Sengoku's innovations have had a substantial impact on the semiconductor industry, pushing the boundaries of materials science and engineering.

Latest Patents

Among his latest innovations is a groundbreaking patent titled “Method for Manufacturing a Dual Work Function Semiconductor Device.” This method involves creating a first silicon oxide layer on a substrate, followed by the deposition of a hafnium-containing dielectric material layer. Sengoku's approach includes forming an aluminum-containing dielectric material layer on the hafnium layer and executing a thermal treatment to achieve an intermixing dielectric layer composed of hafnium, aluminum, silicon, and oxygen. This technique culminates in the formation of a first metal-containing conductive layer that is crucial for constructing a first gate stack.

Another significant patent is related to a semiconductor device designed with a gate insulating film positioned on a semiconductor substrate. This device features a gate electrode consisting of a titanium nitride film and a polysilicon film. An interlayer insulating film secures the gate electrode, and a contact connects the silicon substrate to the gate. These innovations exemplify Sengoku's commitment to advancing semiconductor technology through novel manufacturing methods.

Career Highlights

Sengoku's career includes pivotal roles at esteemed organizations such as Matsushita Electric Industrial Co., Ltd. and Panasonic Corporation. His tenure at these companies allowed him to leverage his skills in semiconductor research and development, significantly contributing to the industry's evolution. His work has been instrumental in enhancing device performance and functionality, supporting the rapid growth of technology in today's digital era.

Collaborations

Throughout his career, Naohisa Sengoku has collaborated with notable colleagues, including Michikazu Matsumoto and Ayumi Kobayashi. These partnerships have fostered a creative environment that nurtures innovation, leading to the development of state-of-the-art semiconductor solutions that address contemporary challenges.

Conclusion

Naohisa Sengoku stands as a leading figure in semiconductor innovation, with a proven track record of patents that highlight his ingenuity and technical expertise. His contributions reflect a deep understanding of materials and processes that push the boundaries of what is possible in semiconductor technology. As the industry continues to evolve, Sengoku's innovations will likely play a crucial role in shaping the future of electronics.

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