Naohiko Hamamura

Title: Naohiko Hamamura: Innovator in Substrate Processing Technologies

Introduction

Naohiko Hamamura is a notable inventor based in Chikushino, Japan. He has made significant contributions to the field of substrate processing, holding a total of 2 patents. His innovative approaches have led to advancements in methods and apparatuses that enhance the efficiency and effectiveness of substrate treatment.

Latest Patents

Hamamura's latest patents include a substrate processing method and a substrates-washing apparatus. The substrate processing method focuses on suppressing particles from remaining on a substrate's surface. This method involves forming a liquid film of a protection liquid on the substrate and utilizing a supercritical fluid for drying, which effectively removes the protection liquid and any residual particles. The substrates-washing apparatus is designed to wash multiple substrates simultaneously. It features a process vessel for storing washing solution, a boat for holding the substrates, and a solution supply system that ensures even distribution of the washing solution through strategically placed apertures.

Career Highlights

Throughout his career, Naohiko Hamamura has worked with prominent companies such as Tokyo Electron Limited and Tokyo Electron Kyushu Limited. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technologies in substrate processing.

Collaborations

Hamamura has collaborated with notable colleagues, including Kenji Yokomizo and Chihaya Tashima. These partnerships have fostered a creative environment that has led to innovative solutions in their field.

Conclusion

Naohiko Hamamura's work in substrate processing technologies exemplifies the impact of innovation in enhancing manufacturing processes. His patents reflect a commitment to improving efficiency and effectiveness in substrate treatment, making him a significant figure in his industry.