Kyungki-Do, South Korea

Myung Kwan Ryu

This inventor holds 6 USPTO granted patents. Top assignees: Boe Hydis Technology Co., Ltd., Hydis Technologies Co., Ltd.. Active years: 2006-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Myung Kwan Ryu. Retrieved from https://idiyas.com/inventor/myung-kwan-ryu-7rmne1g0

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.6

ph-index = 2

Forward Citations = 62(Granted Patents)


Location History:

  • Seoul, KR (2006)
  • Kyoungki-do, KR (2006 - 2010)

Company Filing History:


Years Active: 2006-2010

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6 patents (USPTO):Explore Patents

Title: Myung Kwan Ryu: Innovator in Silicon Crystallization Technologies

Introduction: Myung Kwan Ryu is an accomplished inventor based in Kyoungki-do, South Korea, recognized for his innovative contributions to the field of silicon technology. With a total of 6 patents to his name, Ryu has made significant strides in the crystallization processes of amorphous silicon, which are critical for various applications in electronics.

Latest Patents: Among his latest innovations, Ryu's patent for a "Crystallization pattern and method for crystallizing amorphous silicon using the same" stands out. This method outlines a process that begins with the formation of an amorphous silicon film on a glass substrate. Ryu's technique involves patterning the amorphous silicon film to create a crystallization pattern, which is then transformed into polycrystalline silicon through laser irradiation. The design of the crystallization pattern includes a peripheral region and an internal region, where the internal region is further subdivided into sub-regions, each designed to optimize crystallization.

Another significant patent by Ryu is for a "Method for forming polycrystalline silicon film of polycrystalline silicon TFT." This method details the crystallization of an amorphous silicon film via laser application through a mask pattern, ensuring that the resulting grains develop in a circular shape. This innovative approach is essential for enhancing the performance of thin film transistors, which are widely used in display technologies.

Career Highlights: Myung Kwan Ryu has held key positions at several prominent companies, including BOE Hydis Technology Co., Ltd. and Hydis Technologies Co., Ltd. His work in these companies has allowed him to push the boundaries of silicon technology, contributing to advancements in display and semiconductor industries.

Collaborations: Throughout his career, Ryu has collaborated with notable peers in the industry, including Eok Su Kim and Jae Chul Park. These collaborations not only reflect his ability to work effectively within teams but also underscore his commitment to advancing technological innovations through shared expertise.

Conclusion: Myung Kwan Ryu continues to be a pivotal figure in the development of crystallization methods for silicon technologies. His inventive contributions have not only enhanced manufacturing processes but also facilitated numerous advancements in electronic device performance. As the technology landscape evolves, Ryu's work will likely play an integral role in shaping the future of silicon applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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