Location History:
- St. Egreve, FR (2005 - 2008)
- Saint Egreve, FR (2010 - 2012)
Company Filing History:
Years Active: 2005-2012
Title: Muriel Martinez: Innovator in Germanium Layer Polishing
Introduction
Muriel Martinez is a notable inventor based in St Egreve, France. He has made significant contributions to the field of semiconductor technology, particularly in the polishing of germanium layers. With a total of 7 patents to his name, Martinez has developed innovative methods that enhance the quality and efficiency of semiconductor manufacturing processes.
Latest Patents
One of his latest patents focuses on the polishing of germanium layers. This invention involves a two-step chemical-mechanical polishing process. The first step utilizes a polishing solution with an acidic pH, followed by a second step with an alkaline pH solution. This method results in a polished heteroepitaxial germanium layer with a surface microroughness of less than 0.1 nm RMS and a surface haze level of less than 0.5 ppm. Another significant patent by Martinez addresses the planarization of heteroepitaxial layers. This method employs a polishing pad with specific compressibility and a slurry containing silica particles. The approach effectively eliminates surface defects while achieving a desirable final polish.
Career Highlights
Throughout his career, Muriel Martinez has worked with several prominent companies in the semiconductor industry. Notably, he has been associated with SOITEC Silicon on Insulator Technologies. His work has contributed to advancements in the manufacturing processes of semiconductor materials, particularly in enhancing the quality of heteroepitaxial layers.
Collaborations
Martinez has collaborated with various professionals in his field, including Olivier Rayssac and Sephorah Bisson. These collaborations have fostered innovation and the sharing of expertise, further advancing the technology in which he specializes.
Conclusion
Muriel Martinez stands out as an influential inventor in the realm of semiconductor technology. His innovative patents and contributions to the polishing of germanium layers have significantly impacted the industry. His work continues to pave the way for advancements in semiconductor manufacturing processes.