Company Filing History:
Years Active: 2020-2023
Title: Muneyuki Omi: Innovator in Substrate Processing Technologies
Introduction
Muneyuki Omi, an accomplished inventor based in Miyagi, Japan, has made significant contributions to the field of substrate processing. With a total of three patents to his name, Omi's work demonstrates his expertise and commitment to advancing technology in this critical area.
Latest Patents
Omi's latest innovations include a series of patents that focus on substrate processing methods and apparatuses. One notable patent is for a substrate processing method that involves preparing a substrate with an etching target film and a mask, followed by plasma etching and subsequent heat treatments. This method enhances the efficiency and effectiveness of substrate preparation.
Additionally, Omi developed a plasma processing method which incorporates a coolant system designed to facilitate better plasma processing of substrates. This method includes provisions for a dummy substrate, which serves to improve the overall cleaning process by removing reaction products generated during plasma exposure.
Career Highlights
Muneyuki Omi currently works at Tokyo Electron Limited, a key player in the semiconductor manufacturing equipment sector. His role at the company allows him to apply his inventive skills and collaborate with leading experts in the field to push the boundaries of substrate processing technology.
Collaborations
Throughout his career, Omi has worked alongside talented colleagues, including Takahiro Murakami and Rei Ibuka. Together, they have contributed to developing innovative solutions that have a meaningful impact on the semiconductor industry.
Conclusion
Muneyuki Omi’s contributions to substrate processing highlight his role as a prominent inventor in the field. With his dedication and innovative mindset, he continues to influence and improve technology within the sector, ensuring that advancements in semiconductor manufacturing are at the forefront of modern industry.