Location History:
- Hsin-chu, TW (2015)
- Shanghai, CN (2021)
Company Filing History:
Years Active: 2015-2021
Title: Innovations by Motoki Noro
Introduction
Motoki Noro is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of substrate processing and plasma treatment technologies. With a total of 3 patents to his name, Noro's work has advanced the capabilities of semiconductor manufacturing.
Latest Patents
Noro's latest patents include a substrate processing method and a substrate processing apparatus. The substrate processing method involves a substrate that includes a first film of a silicon-containing film and a second film with a second aperture formed on the first film. This method includes preparing the substrate, controlling its temperature to -30°C or less, and etching the first film through the second aperture using plasma formed from a first process gas containing a fluorocarbon gas. This etching process results in a first aperture of a tapered shape, where the width gradually decreases toward the bottom.
Another significant patent is the plasma treatment method and plasma treatment device. This device features a dielectric window containing SiO. The insulating film to be etched comprises silicon carbonitride. In the first plasma treatment step, a processing gas that contains no oxygen gas and includes CHF is used to deposit a protective film. In the second plasma treatment step, a processing gas containing oxygen gas and CHF is utilized to etch away the top and other portions of a part with a convex cross-sectional shape.
Career Highlights
Motoki Noro is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work focuses on innovative solutions that enhance substrate processing and plasma treatment techniques. Noro's expertise has positioned him as a key figure in advancing semiconductor manufacturing processes.
Collaborations
Throughout his career, Noro has collaborated with talented individuals such as Shinji Kawada and Masaki Inoue. These collaborations have contributed to the development of cutting-edge technologies in the semiconductor field.
Conclusion
Motoki Noro's contributions to substrate processing and plasma treatment technologies have made a significant impact on the semiconductor industry. His innovative patents and collaborations reflect his dedication to advancing technology in this critical field.