Ramat Hashron, Israel

Moshe Nakash

USPTO Granted Patents = 6 

 

Average Co-Inventor Count = 2.8

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2011-2014

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6 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Moshe Nakash in Lithography**

Introduction

Moshe Nakash, a talented inventor based in Ramat Hashron, Israel, has made significant contributions to the field of lithographic printing technologies. With a total of six patents to his name, Nakash has developed innovative methods and materials that enhance the efficiency and quality of lithographic processes.

Latest Patents

One of his recent patents focuses on methods for preparing lithographic printing plates. This patent describes a lithographic processing solution with a pH of less than 12, which includes a specific formulation of a water-soluble or water-dispersible, non-IR-sensitive compound. The solution's unique chemical composition allows it to effectively develop both single-layer and multi-layer positive-working lithographic printing plate precursors that are imaged using infrared radiation.

Another noteworthy patent by Nakash pertains to positive-working radiation-sensitive imageable elements. In this invention, Nakash outlines a method for preparing imageable elements with improved sensitivity, high resolution, and solvent resistance. These elements utilize a water-insoluble polymeric binder with specific recurring units and substitution patterns, enabling the production of high-quality lithographic printing plates.

Career Highlights

Moshe Nakash's career is highlighted by his association with Eastman Kodak Company, where he has honed his expertise in printing technologies and materials. His continued efforts in innovation have propelled advancements in lithographic processes, making significant impacts on the industry.

Collaborations

Throughout his career, Nakash has collaborated with esteemed coworkers such as Moshe Levanon and Tanya Kurtser. These collaborations have been instrumental in fostering innovation and enhancing the research and development activities within the lithographic printing domain.

Conclusion

In summary, Moshe Nakash stands out as a prominent figure in the realm of lithography. His inventive spirit and multiple patents reflect a commitment to improving printing technologies, paving the way for future advancements in the field. Through his work at Eastman Kodak Company and his collaborations, Nakash continues to influence the evolution of lithographic practices and materials.

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