The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2014
Filed:
Sep. 14, 2012
Celin Savariar-hauck, Badenhausen, DE;
Gerhard Hauck, Badenhausen, DE;
Moshe Nakash, Ramat Hashron, IL;
Celin Savariar-Hauck, Badenhausen, DE;
Gerhard Hauck, Badenhausen, DE;
Moshe Nakash, Ramat Hashron, IL;
Eastman Kodak Company, Rochester, NY (US);
Abstract
A lithographic processing solution has a pH of less than 12 and comprises at least 0.001 and up to and including 1 weight % of a water-soluble or water-dispersible, non-IR-sensitive compound that has a heterocyclic moiety with a quaternary nitrogen in the 1-position of the heterocyclic ring, and has one or more electron donating substituents attached to the heterocyclic ring, at least one of which electron donating substituents is attached in the 2-position. This processing solution can be used to develop both single-layer and multi-layer positive-working lithographic printing plate precursors that have been imaged using infrared radiation.