The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 12, 2012

Filed:

Feb. 04, 2008
Applicants:

Moshe Levanon, Ness-Ziona, IL;

Moshe Nakash, Ramat Hashron, IL;

Tanya Kurtser, Petach Tiqwa, IL;

Inventors:

Moshe Levanon, Ness-Ziona, IL;

Moshe Nakash, Ramat Hashron, IL;

Tanya Kurtser, Petach Tiqwa, IL;

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of making imaged elements such as lithographic printing plates is achieved by imagewise exposing a positive-working imageable element using energy of less than 300 mJ/cmto provide exposed and non-exposed regions. The imaged element is developed using an alkaline, silicate-free solution containing a carbonate to remove predominantly only the exposed regions to provide an image. The imageable element comprises a substrate and a radiation absorbing compound, and has an imageable layer on the substrate that comprises a developability-enhancing compound and a poly(vinyl acetal) in which at least 25 mol % of its recurring units comprise pendant nitro-substituted phenolic groups.


Find Patent Forward Citations

Loading…