The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 2011

Filed:

May. 22, 2008
Applicants:

Moshe Levanon, Ness-Ziona, IL;

Moshe Nakash, Ramat Hashron, IL;

Inventors:

Moshe Levanon, Ness-Ziona, IL;

Moshe Nakash, Ramat Hashron, IL;

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41C 1/10 (2006.01); B41M 5/36 (2006.01); G03F 7/039 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of making imaged elements such as lithographic printing plates is achieved by imagewise exposing an infrared radiation-sensitive positive-working imageable element to provide exposed and non-exposed regions. The imaged element is developed using a single processing solution having a pH of from about 9 to about 11.5 and containing carbonate ion and at least 1 weight % of one or more anionic surfactants, to remove predominantly only the exposed regions to provide an image and to provide a protective coating on the imaged surface. The imageable element comprises a substrate and a radiation absorbing compound, and has an imageable layer on the substrate that comprises a developability-enhancing compound and a poly(vinyl acetal) in which at least 25 mol % of its recurring units comprise pendant nitro-substituted phenolic groups.


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