Tokyo, Japan

Morio Hosoya


 

Average Co-Inventor Count = 1.7

ph-index = 5

Forward Citations = 71(Granted Patents)


Location History:

  • Musashino, JP (2004)
  • Tokyo, JP (2004 - 2015)
  • Shinjuku-ku, JP (2011 - 2016)

Company Filing History:


Years Active: 2004-2016

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16 patents (USPTO):Explore Patents

Title: **The Innovative Journey of Morio Hosoya**

Introduction

Morio Hosoya, based in Tokyo, Japan, is a distinguished inventor with an impressive portfolio of 16 patents. He has dedicated his career to pushing the boundaries of technology, significantly impacting the field of photomask technology, essential for high-resolution imaging and manufacturing processes in semiconductor production.

Latest Patents

Among his latest contributions are the inventions of a reflective mask blank and a method of manufacturing a reflective mask. His innovative designs focus on enhancing the contrast for inspection light with wavelengths of 200 nm or less. The reflective mask blank features a multilayer reflective film optimized for various light exposures, incorporating protective and absorber films made of advanced materials like ruthenium and nitride compounds. Furthermore, his patents also include a novel photomask blank designed to produce photomasks used with ArF excimer laser light, ensuring superior light transmission and protection against reflection through a unique multilayer structure.

Career Highlights

Morio Hosoya currently works at Hoya Corporation, a leader in optical products and photomasks. His work in this capacity has not only solidified his status as an innovator but also contributed to advancements in manufacturing precision optics. His patents reflect not only technical prowess but also a deep understanding of material science and engineering.

Collaborations

Throughout his career, Morio has collaborated with talented individuals such as Tsutomu Shoki and Shinichi Ishibashi. Together, they have combined their expertise to enhance the development of photomasks and related technologies, streamlining processes that are vital for the semiconductor industry.

Conclusion

Morio Hosoya's contributions to innovation in photomask technology underscore his role as a pivotal figure in the field. With his extensive patent portfolio and collaborative spirit, he continues to inspire future advancements and set benchmarks in quality and performance within the industry. His work is a testament to how inventive thinking and collaboration can drive technological progress forward.

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