The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7804648 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 28, 2010

Filed:

Oct. 16, 2006
Applicants:

Morio Hosoya, Tokyo, JP;

Takeyuki Yamada, Yamanashi, JP;

Akira Ikeda, Chiba, JP;

Inventors:

Morio Hosoya, Tokyo, JP;

Takeyuki Yamada, Yamanashi, JP;

Akira Ikeda, Chiba, JP;

Assignee:

Hoya Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 1/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

A multilayer reflective film coated substrate includes a multilayer under film comprised of Mo/Si alternately-layered films and a multilayer reflective film comprised of Mo/Si alternately-layered films for reflecting exposure light. The multilayer under film and the multilayer reflective film are formed on a substrate in this order. Given that a cycle length of the multilayer under film is d bottom (unit:nm) and a cycle length of the multilayer reflective film is d top (unit:nm), a relationship of a formula (1) is satisfied when d bottom>d top, the formula (1) given by(+0.15)×top≦bottom≦(+0.9)×topwhere n is a natural number equal to or greater than 1.


Find Patent Forward Citations

Hosoya, Morio. (2010). Multilayer reflective film coated substrate, manufacturing method thereof, reflective mask blank, and reflective mask (U.S. Patent No. 7804648). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7804648

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