The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2013
Filed:
Dec. 24, 2009
Morio Hosoya, Tokyo, JP;
Morio Hosoya, Tokyo, JP;
Hoya Corporation, Tokyo, JP;
Abstract
Provided are a reflective mask blank and a reflective mask which are capable of improving the contrast for inspection light having a wavelength of 200 nm or less in an inspection, capable of improving the contrast for exposure light in use of the mask, and capable of forming a high-resolution fine pattern. A reflective mask blankincludes a substrate, and a multilayer reflective filmadapted to reflect exposure light, a protective filmcomposed mainly of ruthenium (Ru) or its compound on the multilayer reflective film, and an absorber filmadapted to absorb the exposure light, which are formed in this order on the substrate. The absorber filmhas a laminated structure including an uppermost layerand a lower layer. The uppermost layeris formed of a material composed mainly of a nitride, an oxide, an oxynitride, a carbide, a carbonitride, or an oxycarbonitride of at least one or more elements selected from Si and Cr. A reflective maskis obtained by forming a transfer pattern in the absorber film of the reflective mask blank.