The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2013
Filed:
Jan. 29, 2010
Morio Hosoya, Tokyo, JP;
Morio Hosoya, Tokyo, JP;
Hoya Corporation, Tokyo, JP;
Abstract
Disclosed is a reflective mask blank () which comprises a substrate (), a multilayer reflective film () for reflecting exposure light, a buffer film (), and an absorber film () for absorbing exposure light, said films being sequentially formed on the substrate. The absorber film () has a multilayer structure which is composed of an uppermost layer () and a lower layer (). The uppermost layer is formed from a material containing oxide, oxynitride or carbide of Ta, and has a refractive index (n) of 0.95-0.97 and an extinction coefficient (k) of from −0.033 to −0.023. The lower layer is formed from a material containing Ta, and has a refractive index (n) of 0.94-0.97 and an extinction coefficient (k) of from −0.050 to −0.036. A reflective mask () can be obtained by forming a transfer pattern on the absorber film of the reflective mask blank.