Location History:
- Shizuoka, JP (2010)
- Numazu, JP (2018 - 2023)
Company Filing History:
Years Active: 2010-2023
Title: Mitsuru Kekura: Innovator in Atomic Layer Deposition Technology
Introduction
Mitsuru Kekura is a prominent inventor based in Numazu, Japan. He has made significant contributions to the field of atomic layer deposition (ALD) technology. With a total of 8 patents to his name, Kekura continues to push the boundaries of innovation in materials science.
Latest Patents
Kekura's latest patents include an atomic layer deposition device and an atomic layer deposition method. The ALD device features a shower head positioned opposite the film formation surface of a target workpiece within a chamber. This device includes raw material gas ejection ports and OH* forming gas ejection ports that are alternately arranged at predetermined intervals. The OH* forming gas ejection ports consist of first ejection ports for ozone gas and second ejection ports for unsaturated hydrocarbon gas. This innovative design allows for the formation of an oxide film on the film formation surface by ejecting raw material gas and ozone gas while moving the target workpiece. Another notable patent is for a degradable resin molding and production method. This involves a degradable film with a barrier layer on a water-soluble polymer layer, utilizing a CVD process for its formation.
Career Highlights
Kekura is currently employed at Meidensha Corporation, where he applies his expertise in developing advanced technologies. His work has been instrumental in enhancing the efficiency and effectiveness of ALD processes, which are crucial in various applications, including semiconductor manufacturing.
Collaborations
Kekura has collaborated with notable colleagues such as Toshinori Miura and Naoto Kameda. Their combined efforts have contributed to the advancement of innovative technologies in their field.
Conclusion
Mitsuru Kekura stands out as a key figure in the realm of atomic layer deposition technology. His innovative patents and contributions to Meidensha Corporation highlight his commitment to advancing materials science. His work continues to inspire future developments in the industry.