The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 29, 2022

Filed:

Apr. 22, 2020
Applicant:

Meidensha Corporation, Tokyo, JP;

Inventors:

Toshinori Miura, Chiba, JP;

Mitsuru Kekura, Numazu, JP;

Naoto Kameda, Moriya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J 7/12 (2006.01); C08J 9/36 (2006.01); B01J 15/00 (2006.01); B29C 67/20 (2006.01);
U.S. Cl.
CPC ...
C08J 7/12 (2013.01); B01J 15/005 (2013.01); B29C 67/20 (2013.01); C08J 9/36 (2013.01);
Abstract

A reforming device () is provided with, on one end side of a chamber (), a gas supply part () and, on the other end side of the chamber (), a gas discharge part (). A support part () for supporting a porous material () is provided between the gas supply part () and the gas discharge part () inside the chamber (). Then, the unsaturated hydrocarbon gas of an unsaturated hydrocarbon supply device () and the ozone gas of an ozone generation device () are supplied into the chamber () via the gas supply part () so as to reform the outer-peripheral-side surface and the inner side surface of the porous material () accommodated inside the chamber (). The gas inside the chamber () is sucked by the gas discharge part () and discharged to the outside of the chamber ().


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