Mitsuru Haga

Title: Mitsuru Haga: Innovator in Photoresist Technologies

Introduction

Mitsuru Haga is a prominent inventor based in Minamikanbara-gun, Japan. He has made significant contributions to the field of semiconductor materials, particularly in photoresist compositions and pattern formation methods. With a total of four patents to his name, Haga's work has advanced the technology used in semiconductor manufacturing.

Latest Patents

Haga's latest patents focus on innovative methods for pattern formation using photoresist compositions. One of his notable patents discloses a pattern formation method that involves applying a layer of a photoresist composition over a semiconductor substrate, followed by pattern-wise exposure to i-line radiation. This method results in a resist relief image, utilizing a composition that includes a non-ionic photoacid generator, a solvent, and two types of polymers, one of which contains a polymeric dye. Another patent outlines a method for forming a radiation-sensitive film on a substrate, which includes a photoacid generator and an acid labile polymer. This method also involves patternwise exposure to activating radiation and developing the film with an alkaline solution to create a resist pattern.

Career Highlights

Mitsuru Haga is currently associated with Rohm & Haas Electronic Materials LLC, where he continues to innovate in the field of electronic materials. His expertise in photoresist technologies has positioned him as a key player in the semiconductor industry.

Collaborations

Haga has collaborated with notable colleagues such as Shugaku Kushida and Kunio Kainuma, contributing to advancements in their shared field of expertise.

Conclusion

Mitsuru Haga's contributions to photoresist technologies and his innovative patents have significantly impacted the semiconductor industry. His work continues to pave the way for advancements in electronic materials and manufacturing processes.