The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 2024
Filed:
Oct. 15, 2020
Applicant:
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Inventors:
Assignee:
ROHM AND HAAS ELECTRONIC MATERIALS LLC, Marlborough, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/027 (2006.01); G03F 7/085 (2006.01); G03F 7/32 (2006.01); C07D 221/00 (2006.01); C07D 221/14 (2006.01); C08F 212/14 (2006.01); C07D 211/94 (2006.01); C08F 220/18 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07D 221/00 (2013.01); C07D 221/14 (2013.01); G03F 7/027 (2013.01); G03F 7/085 (2013.01); G03F 7/322 (2013.01); C07D 211/94 (2013.01); C08F 212/24 (2020.02); C08F 220/18 (2013.01);
Abstract
Disclosed herein is a method comprising forming a radiation-sensitive film on a substrate; wherein the radiation-sensitive film comprises a radiation-sensitive composition comprising a photoacid generator; a quencher; an acid labile polymer formed from monomers comprising a vinyl aromatic monomer and a monomer comprising an acid decomposable group; and a solvent; patternwise exposing the radiation-sensitive film to activating radiation; and contacting the radiation-sensitive film with an alkaline developing solution to form a resist pattern.