Location History:
- Hyogo, JP (2001)
- Tokyo, JP (2002 - 2009)
Company Filing History:
Years Active: 2001-2009
Title: Mitsuo Kimoto: Innovator in Semiconductor Technology
Introduction
Mitsuo Kimoto is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving the reliability and production yield of semiconductor devices.
Latest Patents
One of his latest patents is a method of dry cleaning silicon surfaces prior to forming a self-aligned nickel silicide layer. This innovative method involves placing a semiconductor wafer over a wafer stage equipped with a dry cleaning chamber. The wafer undergoes dry cleaning treatment with a reducing gas, followed by heat treatment at a first temperature of 100 to 150°C. The wafer is then vacuum-transferred to a heat treatment chamber for further processing. This invention enhances the reliability and production yield of semiconductor devices by minimizing variations in the electrical properties of the nickel silicide layer.
Another notable patent is a method of producing a semiconductor device with a polymetal wiring structure. This method includes forming a polycrystalline silicon film and a tungsten nitride film on a silicon substrate. It also involves creating a tungsten film using a target of tungsten containing minimal fluorine. The process results in reduced fluorine content, prevention of film separation, and improved transistor properties.
Career Highlights
Mitsuo Kimoto has worked with Mitsubishi Denki Kabushiki Kaisha, where he has contributed to various advancements in semiconductor technology. His expertise and innovative approaches have made a significant impact in the industry.
Collaborations
Throughout his career, Kimoto has collaborated with notable individuals such as Noboru Sekiguchi and Kimio Hagi. These collaborations have further enriched his work and contributions to the field.
Conclusion
Mitsuo Kimoto is a distinguished inventor whose work in semiconductor technology has led to important advancements. His patents reflect a commitment to improving device reliability and performance. His contributions continue to influence the semiconductor industry positively.