Tokyo, Japan

Mitsuhiro Tomikawa

USPTO Granted Patents = 12 

Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2019-2023

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12 patents (USPTO):Explore Patents

Title: Mitsuhiro Tomikawa: Innovator in Thin Film Capacitors

Introduction

Mitsuhiro Tomikawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of electronics, particularly in the development of thin film capacitors. With a total of 12 patents to his name, Tomikawa continues to push the boundaries of innovation in his industry.

Latest Patents

Among his latest patents, Tomikawa has developed a thin film capacitor that features a lower electrode layer, an upper electrode layer, and a dielectric layer positioned between them. This innovative design includes a first metal layer that faces the dielectric layer and a second metal layer that faces away from it. The first metal layer has a surface roughness that is greater on one side than the other, enhancing its performance. Additionally, he has patented an electronic component-incorporating substrate that integrates various insulating and conductor layers, optimizing the arrangement of electronic components for improved functionality.

Career Highlights

Tomikawa is currently employed at TDK Corporation, where he applies his expertise in electronics to develop cutting-edge technologies. His work has been instrumental in advancing the capabilities of electronic components, making them more efficient and reliable.

Collaborations

Throughout his career, Tomikawa has collaborated with notable colleagues, including Kenichi Yoshida and Kazuhiro Yoshikawa. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Mitsuhiro Tomikawa stands out as a key figure in the field of electronics, particularly in the realm of thin film capacitors. His numerous patents and ongoing work at TDK Corporation highlight his commitment to innovation and excellence in technology.

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