This inventor holds 30 USPTO granted patents, primarily in Polymer Chemistry. Top assignees: Nippon Kayaku Kabushiki Kaisha, Mitsubishi Gas Chemical Company, Inc., Nippon Polytech Corp.. Active years: 1984-2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Yamaguchi, JP (1984 - 1989)
- Asa, JP (1988 - 1991)
- Toride, JP (1989 - 2007)
- Ibaraki, JP (2004 - 2008)
Company Filing History:
30 out of 798 
1 out of 2,301 
1 out of 3 
Years Active: 1984-2008
Areas of Expertise:
Title: **Minoru Yokoshima: A Pioneer in Photosensitive Resins**
Introduction
Minoru Yokoshima is a distinguished inventor based in Toride, Japan, known for his significant contributions to the field of photosensitive resins. With a remarkable portfolio of 30 patents, he has made substantial advancements in resin compositions that have practical applications in optical technologies.
Latest Patents
Yokoshima's latest innovations focus on photosensitive resins and their applications. One of his notable patents describes a photosensitive resin that is a product of a reaction between a polyester and various chemical compounds, resulting in an alkali-soluble resin. This technology has led to the development of photosensitive resin compositions that incorporate a diluent, crosslinking agent, and photopolymerization initiator. The products resulting from these compositions are acclaimed for their excellent properties, such as transparency, processability, and resistance to soldering heat, making them ideal for forming optical waveguides. Another patent involves maleimido-bearing compounds that can be cured with light, showcasing his innovative approach to enhancing the performance of resin compositions while reducing the need for photoinitiators.
Career Highlights
Throughout his career, Yokoshima has worked with prominent companies such as Nippon Kayaku Co., Ltd. and Taiyo Ink Manufacturing Co., Ltd. His experience in these industries has significantly influenced his research and development efforts, allowing him to push the boundaries of resin technology.
Collaborations
Yokoshima has collaborated with several talented individuals in his field, including Tetsuo Ohkubo and Kazuyoshi Nawata. Their teamwork and diverse expertise have fostered a collaborative environment that has led to groundbreaking innovations in the realm of photosensitive resins.
Conclusion
Minoru Yokoshima's contributions to the field of photosensitive resins exemplify the impact of dedicated inventors in advancing technology. With his impressive number of patents and collaborative spirit, Yokoshima continues to influence the industry and inspire future innovations in resin applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile