The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 06, 2004

Filed:

Sep. 05, 2001
Applicant:
Inventors:

Satoshi Mori, Tokyo, JP;

Minoru Yokoshima, Ibaraki, JP;

Noriko Kiyoyanagi, Tokyo, JP;

Yuichiro Matsuo, Saitama, JP;

Hiroo Koyanagi, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 6/310 ; C08L 7/514 ; C08L 7/516 ; C08F 2/46 ; H05K 1/02 ;
U.S. Cl.
CPC ...
C08L 6/310 ; C08L 7/514 ; C08L 7/516 ; C08F 2/46 ; H05K 1/02 ;
Abstract

The present invention relates to a new urethane oligomer (A) and a resin composition comprising (A) and an unsaturated group containing polycarboxylic acid resin (B) that can be diluted with water and is excellent in providing a cured product and that is suitable for a solder resist and an interlayer dielectric layer because the cured product is excellent in flexibility, soldering-heat resistance or the like and allows a development with an organic solvent or a dilute alkali solution; a photosensitive resin composition suitable for an etching resist or a cover lay; and a photosensitive film obtained thereby.


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