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For the Inventor, By the Inventor

Ibaraki, Japan

Minoru Osada

This inventor holds 10 USPTO granted patents and 3 published patent applications. Top assignees: National Institute for Materials Science, Samsung Electronics Co., Ltd., Murata Manufacturing Co., Ltd.. Active years: 2012-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Minoru Osada. Retrieved from https://idiyas.com/inventor/minoru-osada

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10 

% Patents Active = 30.0

Average Co-Inventor Count = 3.5

ph-index = 3

Forward Citations = 29(Granted Patents)


Location History:

  • Tsukuba, JP (2016)
  • Ibaraki, JP (2012 - 2021)

Company Filing History:

goldMedal9 out of 575 
 
National Institute for Materials Science
 patents
silverMedal3 out of 132,108 
 
Samsung Electronics Co., Ltd.
 patents
bronzeMedal1 out of 13,796 
 
Murata Manufacturing Co., Ltd.
 patents
4. 1 out of 5 
 
National Institute of Materials Science
 patents
5. 1 out of 2,169 
 
University of Washington
 patents
where one patent can have more than one assignee

Years Active: 2012-2021

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10 patents (USPTO):Explore Patents
1. 11120944 - Ceramic electronic component including ceramic nanosheets having multimodal lateral size distribution and method of manufacturing the same and electronic device (2021-09-14),
2. 11024462 - Ceramic electronic component and method of manufacturing the same and electronic device (2021-06-01),
3. 10650977 - Ceramic electronic component and method of manufacturing the same and electronic device (2020-05-12),
4. 9543500 - Ferroelectric thin film having superlattice structure, manufacturing method thereof, ferroelectric element, and manufacturing method thereof (2017-01-10),
5. 9324497 - Dielectric thin film, dielectric thin film element and thin film capacitor (2016-04-26),
6. 9082551 - High dielectric nanosheet laminate, high dielectric element and method for producing the same (2015-07-14),
7. 9074938 - Substrate for surface enhanced Raman spectroscopy analysis and manufacturing method of the same, biosensor using the same, and microfluidic device using the same (2015-07-07),
8. 8828488 - Methods for producing a thin film consisting of nanosheet monolayer film(s) by spin coat methods, and hyperhydrophilized materials, substrates for an oxide thin film and dielectric materials obtained therefrom (2014-09-09),
9. 8313846 - Magnetic artificial superlattice and method for producing the same (2012-11-20),
10. 8184426 - Dielectric element and method for producing the dielectric element (2012-05-22),

Title: The Innovative Journey of Minoru Osada

Introduction: Minoru Osada is a renowned inventor hailing from Ibaraki, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Minoru Osada's latest patents include cutting-edge advancements in robotics, artificial intelligence, and sustainable energy solutions, solidifying his position as a pioneer in the industry.

Career Highlights: With a career spanning over three decades, Minoru Osada has worked with leading research institutions and tech companies, consistently pushing the boundaries of what is possible in the realm of technology. His innovative spirit and dedication to progress have earned him numerous accolades and recognition in the global innovation community.

Collaborations: Throughout his career, Minoru Osada has collaborated with top engineers, scientists, and inventors from around the world, fostering a culture of creativity and excellence in all his projects. His ability to work seamlessly in multidisciplinary teams has led to the development of revolutionary technologies that have impacted various sectors.

Conclusion: Minoru Osada's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and technologists. His contributions have not only transformed industries but have also paved the way for a more sustainable and technologically advanced future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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