Location History:
- Yokkaichi, JP (2013 - 2015)
- Yokkaichishi, JP (2015)
- Shanghai, CN (2015 - 2023)
Company Filing History:
5 out of 4,538 
1 out of 101 Years Active: 2013-2023
Title: Innovator Ming Tian: Pioneering Advances in Semiconductor Technology
Introduction: Ming Tian, a prominent inventor based in Yokkaichi, Japan, has made significant contributions to the field of semiconductor technology. With a portfolio of six patents, he has developed methods that push the boundaries of how semiconductor devices are manufactured and utilized.
Latest Patents: Among his latest innovations, Ming Tian has patented a method for manufacturing Fully-Depleted Silicon-On-Insulator (FDSOI) devices. This method outlines detailed steps such as providing a semiconductor structure with a silicon substrate and buried oxide layers, and performing precise etching processes to ensure a well-controlled process window free from surface bumps. Additionally, his patent for electrical isolation in non-volatile memory using air gap structures highlights the use of sacrificial films with different etch rates, demonstrating a sophisticated understanding of materials and manufacturing techniques.
Career Highlights: Ming Tian has a commendable career trajectory, having worked with renowned companies like Sandisk Technologies Inc. and Shanghai Huali Integrated Circuit Corporation. His experience in these organizations has contributed heavily to his development as an inventor, allowing him to apply his theoretical knowledge to practical applications in the semiconductor industry.
Collaborations: Collaborating with esteemed colleagues such as Atsushi Suyama and Henry Chien, Ming has fostered an environment of teamwork and innovation. These partnerships have proven fruitful, leading to advancements in semiconductor processes and technologies that have a lasting impact on the industry.
Conclusion: Ming Tian's contributions to semiconductor technology have solidified his reputation as a leading inventor in the field. With multiple patents to his name and a history of collaboration with other experts, his work continues to influence the advancement of semiconductor manufacturing techniques, ensuring a legacy of innovation.