This inventor holds 5 USPTO granted patents and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2018-2025.
Location History:
- Hsin-Chu, TW (2018)
- Taoyuan, TW (2022 - 2024)
Company Filing History:
Years Active: 2018-2025
Title: Innovations of Ming-Shiuan She
Introduction
Ming-Shiuan She is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of chemical mechanical polishing, holding a total of 5 patents. His work has been instrumental in advancing technologies used in semiconductor manufacturing.
Latest Patents
Ming-Shiuan She’s latest patents include innovative methods for the fabrication of polishing pads used in chemical mechanical polishing (CMP) processes. One of his patents describes a method for forming a polishing pad that includes creating an interpenetrating polymer network with a porous top pad. This design ensures consistent surface roughness during the polishing of workpieces. Another patent focuses on a CMP polishing head design that improves removal rate uniformity, featuring a unique retaining ring structure that enhances the efficiency of the polishing process.
Career Highlights
Ming-Shiuan She is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise in CMP technology has positioned him as a key player in the development of advanced manufacturing processes.
Collaborations
Ming-Shiuan She has collaborated with esteemed colleagues such as Shen-Nan Lee and Teng-Chun Tsai. Their combined efforts have contributed to the advancement of innovative solutions in semiconductor manufacturing.
Conclusion
Ming-Shiuan She’s contributions to the field of chemical mechanical polishing demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing processes.