Hsin-Chu, Taiwan

Ming-Shiuan She

USPTO Granted Patents = 5 

Average Co-Inventor Count = 6.6

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Hsin-Chu, TW (2018)
  • Taoyuan, TW (2022 - 2024)

Company Filing History:


Years Active: 2018-2025

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5 patents (USPTO):

Title: Innovations of Ming-Shiuan She

Introduction

Ming-Shiuan She is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of chemical mechanical polishing, holding a total of 5 patents. His work has been instrumental in advancing technologies used in semiconductor manufacturing.

Latest Patents

Ming-Shiuan She’s latest patents include innovative methods for the fabrication of polishing pads used in chemical mechanical polishing (CMP) processes. One of his patents describes a method for forming a polishing pad that includes creating an interpenetrating polymer network with a porous top pad. This design ensures consistent surface roughness during the polishing of workpieces. Another patent focuses on a CMP polishing head design that improves removal rate uniformity, featuring a unique retaining ring structure that enhances the efficiency of the polishing process.

Career Highlights

Ming-Shiuan She is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise in CMP technology has positioned him as a key player in the development of advanced manufacturing processes.

Collaborations

Ming-Shiuan She has collaborated with esteemed colleagues such as Shen-Nan Lee and Teng-Chun Tsai. Their combined efforts have contributed to the advancement of innovative solutions in semiconductor manufacturing.

Conclusion

Ming-Shiuan She’s contributions to the field of chemical mechanical polishing demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing processes.

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