Company Filing History:
Years Active: 2014-2019
Title: Innovations of Ming-Ray Mao
Introduction
Ming-Ray Mao is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on innovative devices that enhance performance and efficiency in electronic applications.
Latest Patents
Ming-Ray Mao's latest patents include a "Stress reduction apparatus with an inverted cup-shaped layer." This device features a metal via with a lower portion in a first etch stop layer and an upper portion in a first dielectric layer over a substrate. Additionally, it incorporates a second etch stop layer in direct contact with the first dielectric layer, a second dielectric layer, and a stress reduction layer. The design ensures that the metal structure, which comprises a lower portion in the second etch stop layer and an upper portion in the stress reduction layer, maintains a level top surface with the stress reduction layer. Another patent titled "Stress reduction apparatus" shares similar features, emphasizing the importance of stress management in semiconductor devices.
Career Highlights
Ming-Ray Mao is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His role involves developing advanced technologies that push the boundaries of electronic device performance. His innovative approach has garnered recognition within the industry.
Collaborations
Ming-Ray has collaborated with notable coworkers, including Kuan-Chi Tsai and Wen-Tsao Chen. Their combined expertise contributes to the advancement of semiconductor technologies and the successful development of innovative solutions.
Conclusion
Ming-Ray Mao's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as a key innovator. His work continues to influence the industry and pave the way for future advancements in electronic devices.